About cookies on this site Our websites require some cookies to function properly (required). In addition, other cookies may be used with your consent to analyze site usage, improve the user experience and for advertising. For more information, please review your options. By visiting our website, you agree to our processing of information as described in IBM’sprivacy statement. To provide a smooth navigation, your cookie preferences will be shared across the IBM web domains listed here.
Conference paper
Development of a new PSM film system for 157 nm extensible to high transmission 193 nm lithography
Abstract
A new attenuated phase shifting film system for 157 nm lithography is presented. Development was done in cooperation between IBM Research Division in Yorktown-Heights and Schott Lithotec in Meiningen. The 157 nm system is designed for 6% transmission but is tunable to higher values. The film system is extensible to be used as a high transmission phase shifter for 193 nm lithography. The presented theoretical film calculations and design are based on VUV Ellipsometer dispersion and transmission data measured at IBM. Tests for laser stability and chemical durability were carried out by IBM and show good performance. First results of defect density and phase and transmission uniformity are presented.
Related
Conference paper
Unassisted true analog neural network training chip
Conference paper