About cookies on this site Our websites require some cookies to function properly (required). In addition, other cookies may be used with your consent to analyze site usage, improve the user experience and for advertising. For more information, please review your options. By visiting our website, you agree to our processing of information as described in IBM’sprivacy statement. To provide a smooth navigation, your cookie preferences will be shared across the IBM web domains listed here.
Publication
physica status solidi (a)
Paper
Crystallization of amorphous silicon films
Abstract
Kinetics and morphology in crystallization of unsupported amorphous silicon films are investigated by hot stage transmission electron microscopy. Crystallization occurs by thermally activated nucleation and growth processes; activation energies of 470 kJ/mol for nucleation and 280 kJ/mol for growth are obtained. Nucleation rates are observed to increase with annealing time, whereas the growth rate depends on the annealing temperature and the crystallographic growth direction. Copyright © 1978 WILEY‐VCH Verlag GmbH & Co. KGaA