Heinz Schmid, Hans Biebuyck, et al.
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Tensile-strained Si on relaxed Si1-xGex buffers has emerged as an important channel material for improving CMOS performance. The ability of tensile-strained Si to dramatically improve MOSFET drive currents has received much attention in the literature in recent years, but little is known about its reliability characteristics. In this review we discuss some of the issues that should be considered in the analysis of hot-electron reliability of strained Si n-channel MOSFETs. © 2005 Elsevier Ltd. All rights reserved.
Heinz Schmid, Hans Biebuyck, et al.
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
M. Hargrove, S.W. Crowder, et al.
IEDM 1998
K.N. Tu
Materials Science and Engineering: A
J.C. Marinace
JES