Publication
Applied Physics Letters
Paper

Comparison of the selective adsorption and reactivity behavior of WF 6 and TaF5 on SiO2 and polyimide surfaces

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Abstract

The initial stages of WF6 and TaF5 adsorption on SiO2 and polyimide surfaces were investigated by photoelectron spectroscopy. WF6 selectively adsorbs on Si relative to SiO 2 and polyimide, while TaF5 exhibited nonselective adsorption behavior. This trend is explained by differences in molecular structure and suggests a general basis for predicting selective deposition.

Date

01 Dec 1990

Publication

Applied Physics Letters

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