Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Many numerical methods call for repeated calculation of the first partial derivatives of a given function of several variables. Errors m a program for that calculation can be hard to discover. A procedure IS offered for testing the program and locating its errors. © 1982, ACM. All rights reserved.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Igor Devetak, Andreas Winter
ISIT 2003
A. Skumanich
SPIE OE/LASE 1992
Mario Blaum, John L. Fan, et al.
IEEE International Symposium on Information Theory - Proceedings