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Publication
ECS Meeting 2007
Conference paper
Challenge for high-k/metal gate CMOSFETs in 32 nm generation and beyond
Abstract
High-k/metal gate stack is highly expected in 32 nm generation CMOSFETs. However, adjustment of threshold voltage, Vth, is still the major challenge for high-k/metal gate CMOSFETs at this point. This paper reviews the current situation and suggested solutions of Hf-related gate dielectrics/metal gate stacks mainly focused on work function control. ©The Electrochemical Society.