Conference paper
Isotropic treatment of EMF effects in advanced photomasks
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SPIE Photomask Technology + EUV Lithography 2009
No abstract available.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
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Journal of the Franklin Institute
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IEEE International Symposium on Information Theory - Proceedings
George Markowsky
J. Math. Anal. Appl.