Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
We consider a single server loss system in which arrivals occur according to a doubly stochastic Poisson process with a stationary ergodic intensity function λ t . The service times are independent, exponentially distributed r.v.'s with mean μ -1, and are independent of arrivals. We obtain monotonicity results for loss probabilities under time scaling as well as under amplitude scaling of λ t . Moreover, using these results we obtain both lower and upper bounds for the loss probability. © 1990 J.C. Baltzer A.G. Scientific Publishing Company.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
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ACM Annual Conference 1975
Robert C. Durbeck
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