Automatic Artwork Generation for Large Scale Integration

Abstract

Large scale integration offers the possibility of very low-cost digital circuits. However, to realize fully the cost potential in LSI, several problems must be solved, one of which is the time and cost involved in preparing, by conventional techniques, masks for LSI chip fabrication. To facilitate mask generation, an artwork generator system has been developed. The system, comprised of a small artwork generator of high capability and a language structure which allows for compact description of chip features, has demonstrated itself capable of substantial savings in mask generation time and cost. Copyright © 1968 by The Institute of Electrical and Electronics Engineers, Inc.