Conference paper
Application of atomic-force microscopy to phase-shift masks
A.P. Ghosh, D.B. Dove, et al.
Microlithography 1992
A modified version of the atomic force microscope is introduced that enables a precise measurement of the force between a tip and a sample over a tip-sample distance range of 30-150 Å. As an application, the force signal is used to maintain the tip-sample spacing constant, so that profiling can be achieved with a spatial resolution of 50 Å. A second scheme allows the simultaneous measurement of force and surface profile; this scheme has been used to obtain material-dependent information from surfaces of electronic materials.
A.P. Ghosh, D.B. Dove, et al.
Microlithography 1992
Y.N. Rajakarunanayake, H.K. Wickramasinghe
Applied Physics Letters
David W. Abraham, C.C. Williams, et al.
Applied Physics Letters
F. Zenhausern, Y. Martin, et al.
Science