Publication
Journal of Applied Physics
Paper

Absence of hillock formation in epitaxial lead films

View publication

Abstract

Epitaxial Pb films with double positioning have been produced by vacuum evaporation of Pb onto mica substrates maintained at 75 °C during deposition. Such films do not exhibit hillock formation when repeatedly cycled between room temperature and 77 °K or annealed at 373 °K. This is in contrast to the observation on nonepitaxial Pb films which do exhibit hillock formations when subjected to similar treatments. The difference has been interpreted in terms of grain-boundary orientation and structure.

Date

02 Sep 2008

Publication

Journal of Applied Physics

Authors

Share