A system for determining the mass and energy of particles incident on a substrate in a planar diode sputtering system

Abstract

A bakable ultrahigh vacuum system has been constructed to sample the particle flux incident on the substrate of a planar diode sputtering system. A beam of particles from the discharge is extracted into a long mean free path environment where it passes through a 90° deflection electrostatic analyzer into a quadrupole residual gas analyzer. The mass spectra of positive ions incident on a substrate during dc sputtering of copper and aluminum bronze are shown and the influence of hydrogen contamination is illustrated. The energy distribution of the Ar+ ions is presented for several values of the substrate bias. © 1970 The American Institute of Physics.