J.M.E. Harper, K.P. Rodbell, et al.
MRS Spring Meeting 1997
A novel reduced mask process is used to fabricate high-resolution high-aperture-ratio 10.5-in. SXCA (1280 × 1024) displays. The process uses copper gate-metallurgy with redundancy, without the need for extra processing steps. The resulting displays have 150-dpi color resolution, an aperture ratio of over 35%, and excellent image quality, making them the first high-resolution displays that are suitable for notebook applications.
J.M.E. Harper, K.P. Rodbell, et al.
MRS Spring Meeting 1997
D.Y. Shih, J. Paraszczak, et al.
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
John Knickerbocker, Paul Andry, et al.
ECTC 2012
E.G. Colgan, B.K. Furman, et al.
ICNMM 2006