Conference paper
High conductivity gate metallurgy for TFT/LCD's
P.M. Fryer, E.G. Colgan, et al.
MRS Spring Meeting 1998
A novel reduced mask process is used to fabricate high-resolution high-aperture-ratio 10.5-in. SXCA (1280 × 1024) displays. The process uses copper gate-metallurgy with redundancy, without the need for extra processing steps. The resulting displays have 150-dpi color resolution, an aperture ratio of over 35%, and excellent image quality, making them the first high-resolution displays that are suitable for notebook applications.
P.M. Fryer, E.G. Colgan, et al.
MRS Spring Meeting 1998
S.C. Lien, C. Cai, et al.
Japanese Journal of Applied Physics, Part 2: Letters
D.C. Worledge, P.L. Trouilloud, et al.
Journal of Applied Physics
J.P. Gambino, E.G. Colgan, et al.
JES