Conference paper
Integration of direct plating of Cu onto a CVD Ru liner
S. Malhotra, D. Canaperi, et al.
AMC 2004
The interaction between B2H6 and SiO2 was investigated by soft x-ray photoemission. Thermally activated, autocatalytic dissociative chemisorption of B2H6 on SiO2 to form elemental films was discovered at temperatures exceeding 550°C. These surfaces are shown to be quite reactive towards SiH2Cl2. This process is thus a mechanism whereby the selectivity of chemical vapor deposition exhibited by SiH2Cl2 towards SiO2 can be rapidly degraded.
S. Malhotra, D. Canaperi, et al.
AMC 2004
Sunghee Lee, Mark M. Banaszak Holl, et al.
Applied Physics Letters
K.T. Nicholson, K.Z. Zhang, et al.
Journal of Applied Physics
J.A. Yarmoff, S.A. Joyce, et al.
Journal of Electron Spectroscopy and Related Phenomena