Yang Liu, Mathieu Luisier, et al.
IEEE T-ED
Many fabricated III-V MOSFETs have electrically thin field oxide (FOX) that leads to parasitic currents and parasitic capacitances. When extracting long-channel mobility of such devices using the conventional two-FET method, some of these parasitic components are not subtracted out. In this paper, we present a simple four-FET method for extracting long-channel mobility that works well even when the equivalent oxide thickness (EOT) of the FOX is equal to the EOT of the FET gate oxide.
Yang Liu, Mathieu Luisier, et al.
IEEE T-ED
Xiao Sun, Christopher P. D’Emic, et al.
VLSI Technology 2017
Yanning Sun, Amlan Majumdar, et al.
IEDM 2014
Sarunya Bangsaruntip, Guy M. Cohen, et al.
IEEE Electron Device Letters