Joachim N. Burghartz, Jean-Olivier Plouchart, et al.
IEEE Electron Device Letters
A 90-nm silicon-on-insulator (SOI) CMOS system on-chip integrates high-performance FETs with 243-GHz Ft, 208-GHz Fmax, 1.45-mS/μm gm, and sub 1.1-dB NFmin up to 26 GHz. Inductor Q of 20, VNCAP of 1.8-fF/μm2, varactor with a tuning range as high as 25:1, and a low-loss microstrip. Transmission lines were successfully integrated without extra masks and processing steps. SOI and its low parasitic junction capacitance enables this high level of performance and will expand the use of CMOS for millimeter-wave applications. © 2005 IEEE.
Joachim N. Burghartz, Jean-Olivier Plouchart, et al.
IEEE Electron Device Letters
Scott K. Springer, Sungjae Lee, et al.
IEEE Transactions on Electron Devices
Jonghae Kim, Jean-Olivier Plouchart, et al.
RFIC 2003
Ongyeun Cho, Daeik D. Kim, et al.
IEEE Trans Semicond Manuf