3D-XY critical behavior in La2-xSrxCuO4 thin films probed by penetration depth measurement

Y. Jaccard; T. Schneider; J.P. Locquet; E.J. Williams; Ø. Fischer; P. Martinoli

doi:10.1007/BF02583847

Czechoslovak Journal of Physics

Paper

01 Dec 1996

3D-XY critical behavior in La_2-xSr_xCuO₄ thin films probed by penetration depth measurement

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Abstract

We sketch the evidence for anisotropic 3D-XY critical behavior in La2-xSrxCuO4 thin films and explore the implications of this scenario, supplemented by the experimental phase transition line.

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Exploring the microscopic origin of exchange bias with photoelectron emission microscopy (invited)

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Evidence of 3D-XY critical behaviour in La_2-xSr_xCuO₄ films

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