SPEED ENHANCEMENTS AND KEY DESIGN ASPECTS OF CHARGE BUFFERED LOGIC.
- S.K. Wiedmann
- D.F. Wendel
- 1985
- VLSI Technology 1985
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LPCVD TUNGSTEN SILICIDE WITH TITANIUM UNDERLAYER.
- R.V. Joshi
- L. Krusin-Elbaum
- et al.
- 1985
- VLSI Technology 1985
0. 5 MICRON GATE CMOS TECHNOLOGY USING E-BEAM/OPTICAL MIX LITHOGRAPHY.
- L.K. Wang
- Y. Taur
- et al.
- 1985
- VLSI Technology 1985