Strain engineered extremely thin SOI (ETSOI) for high-performance CMOS
- A. Khakifirooz
- Kangguo Cheng
- et al.
- 2012
- VLSI Technology 2012
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3 results for N. Daval
Opportunities and challenges for germanium and silicon-germanium channel p-FETs
- S.W. Bedell
- N. Daval
- et al.
- 2009
- ECS Meeting 2009
New opportunities for SiGe and Ge channel p-FETs
- S.W. Bedell
- N. Daval
- et al.
- 2011
- Microelectronic Engineering