Topological semimetals for scaled back-end-of-line interconnect beyond Cu
- Ching-Tzu Chen
- Utkarsh Bajpai
- et al.
- 2020
- IEDM 2020
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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2 results for Chuang Han Hsu
Unconventional resistivity scaling in topological semimetal CoSi
- Shang-Wei Lien
- Ion Garate
- et al.
- 2023
- npj Quantum Materials