0.026μm2 high performance Embedded DRAM in 22nm technology for server and SOC applications
- C. Pei
- G. Wang
- et al.
- 2014
- IEDM 2014
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3 results for K. Hawkins
A 0.039um2 high performance eDRAM cell based on 32nm high-K/metal SOI technology
- Nauman Z. Butt
- Kevin McStay
- et al.
- 2010
- IEDM 2010
Methodology for trench capacitor etch optimization using voltage contrast inspection and special processing
- Oliver D. Patterson
- Xing J. Zhou
- et al.
- 2010
- ASMC 2010