Ultrathin conformal multilayer SiNO dielectric cap for capacitance reduction in Cu/low k interconnects
- IITC/AMC 2016
This is our catalog of recent publications authored by IBM researchers, in collaboration with the global research community. We’re currently adding our back catalog of more than 110,000 publications. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.