Publications

2 results for D. Fey

AFM characterization for Gate-All-Around (GAA) devices
- - Mary Breton
  - Jennifer Fullam
  - et al.
- 2020
- SPIE Advanced Lithography 2020
Line top loss and line top roughness characterizations of EUV resists
- - Daniel Schmidt
  - Karen Petrillo
  - et al.
- 2020
- SPIE Advanced Lithography 2020