High performance 45-nm SOI technology with enhanced strain, porous low-k BEOL, and immersion lithography
- S. Narasimha
- K. Onishi
- et al.
- 2006
- IEDM 2006
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4 results for Michael Crouse
Design intent optimization at the beyond 7nm node: The intersection of DTCO and EUVL stochastic mitigation techniques
- Michael Crouse
- L. Liebmann
- et al.
- 2017
- SPIE Advanced Lithography 2017
Lens heating challenges for negative tone develop layers with freeform illumination: A comparative study of experimental vs. simulated results
- Scott Halle
- Michael Crouse
- et al.
- 2012
- SPIE Advanced Lithography 2012
Lithography process optimization using linear superposition of commonly available illumination modes
- Michael M. Crouse
- Yasri Yudhistira
- et al.
- 2006
- SPIE Advanced Lithography 2006