Conversion of a Patterned Organic Resist into a High Performance Inorganic Hard Mask for High Resolution Pattern Transfer
- Jean-François De Marneffe
- Boon Teik Chan
- et al.
- 2018
- ACS Nano
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3 results for Jean-François De Marneffe
Tailored molecular glass resists for scanning probe lithography
- Christian Neuber
- Hans-Werner Schmidt
- et al.
- 2015
- SPIE Advanced Lithography 2015
Molecular glass resists for scanning probe lithography
- Christian Neuber
- Andreas Ringk
- et al.
- 2014
- SPIE Advanced Lithography 2014