Fundamental aspects of norbornene-maleic anhydride co- and terpolymers for 193 nm lithography: Polymerization chemistry and polymer properties
- Hiroshi Ito
- Dolores C. Miller
- et al.
- 2000
- J. Photopolym. Sci. Tech.
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44 results for M.H. Sherwood
Investigation of deep UV resists by NMR: Residual casting solvents, chemistries, and PAG decomposition in film
- Hiroshi Ito
- Mark Sherwood
- 1999
- J. Photopolym. Sci. Tech.
Etch selectivity of 4SiMA: Hydroxystyrene based copolymers. silicon chemistry for bilayer resist systems
- G.M. Wallraff
- Carl E. Larson
- et al.
- 1998
- J. Photopolym. Sci. Tech.
Merged-Element Transmons: Design and Qubit Performance
- H.J. Mamin
- E. Huang
- et al.
- 2021
- Physical Review Applied
Thermally induced nanoimprinting of biodegradable polycarbonates using dynamic covalent cross-links
- Wiriya Thongsomboon
- Mark Sherwood
- et al.
- 2012
- ACS Macro Letters
Detecting external electron spins using nitrogen-vacancy centers
- H.J. Mamin
- M.H. Sherwood
- et al.
- 2012
- Physical Review B - CMMP
Limitations in rechargeability of li-o 2 batteries and possible origins
- Bryan D. McCloskey
- D.S. Bethune
- et al.
- 2012
- Journal of Physical Chemistry Letters
High field-gradient dysprosium tips for magnetic resonance force microscopy
- H.J. Mamin
- Charles T. Rettner
- et al.
- 2012
- Applied Physics Letters
Facile chemical rearrangement for photopatterning of POSS derivatives
- Jitendra Rathore
- Qiu Dai
- et al.
- 2011
- Journal of Materials Chemistry
Molecular origins of the mechanical behavior of hybrid glasses
- Mark S. Oliver
- Geraud Dubois
- et al.
- 2010
- Advanced Functional Materials