Consideration on segregation behavior of the surface localization material and the pattern roughness degradation in EUV lithographyKwangMo ChoiYunJi Kimet al.2025SPIE Advanced Lithography 2025
Effect of Composition Uniformity in the Polymer Chain of EUV Photoresist on Lithographic PerformanceEuiJin KoYooRim Janget al.2025SPIE Advanced Lithography 2025
The Impact of Polymer Compositional Homogeneity on Lithography and DefectsBenjamin D. Rafael-NaabJong Keun Parket al.2025SPIE Advanced Lithography 2025