The Impact of Polymer Compositional Homogeneity on Lithography and Defects
- Benjamin D. Rafael-Naab
- Jong Keun Park
- et al.
- 2025
- SPIE Advanced Lithography 2025
Publications
3 results for Mike Finch
Identifying trends in photoresist polymer properties to improve line and space defects Considerations to Improve Microbridge Defectivity in EUV Chemically Amplified Photoresists
- Benjamin D. Rafael-Naab
- Jong Keun Park
- et al.
- 2024
- SPIE Advanced Lithography 2024
Impact of increasing EUV absorption of CAR polymers on lithographic performance
- Yinjie Cen
- Emad Aqad
- et al.
- 2024
- SPIE Advanced Lithography 2024