The Impact of Polymer Compositional Homogeneity on Lithography and DefectsBenjamin D. Rafael-NaabJong Keun Parket al.2025SPIE Advanced Lithography 2025
Identifying trends in photoresist polymer properties to improve line and space defects Considerations to Improve Microbridge Defectivity in EUV Chemically Amplified PhotoresistsBenjamin D. Rafael-NaabJong Keun Parket al.2024SPIE Advanced Lithography 2024
Impact of increasing EUV absorption of CAR polymers on lithographic performanceYinjie CenEmad Aqadet al.2024SPIE Advanced Lithography 2024