Impact of increasing EUV absorption of CAR polymers on lithographic performance
- Yinjie Cen
- Emad Aqad
- et al.
- 2024
- SPIE Advanced Lithography 2024
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Identifying trends in photoresist polymer properties to improve line and space defects Considerations to Improve Microbridge Defectivity in EUV Chemically Amplified Photoresists
- Benjamin D. Rafael-Naab
- Jong Keun Park
- et al.
- 2024
- SPIE Advanced Lithography 2024
Advanced EUV CAR small molecule compounds design and its impact to etch performance
- Yinjie Cen
- Jong Keun Park
- et al.
- 2024
- SPIE Advanced Lithography 2024