Advanced Multi-Vt Enabled by Selective Layer Reductions for 2nm Nanosheet Technology and Beyond
- Ruqiang Bao
- Yusuke Oniki
- et al.
- 2024
- IEDM 2024
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Scatterometry-informed machine learning study to determine bi-directional intercorrelation of adjacent patterning steps
- Padraig Timoney
- Stefan Schoeche
- et al.
- 2025
- SPIE Advanced Lithography + Patterning 2025
Wet Etch Recipe Optimization for Enabling RMG Multi Vt Scheme
- Alma Vela Ramirez
- Sankar Sankarapandian
- et al.
- 2024
- ASMC 2024