Characterization and simulation of acid catalyzed DUV positive photoresist
- Nicholas K. Eib
- Eytan Barouch
- et al.
- 1993
- Microlithography 1993
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
Date
Featured collections
Popular topics
2 results for Nicholas K. Eib
TAR processing for CD control in I-line and 248 nm lithography
- Christopher Lyons
- Nicholas Eib
- et al.
- 1993
- Microlithography 1993