An amorphous silicon thin film transistor fabricated at 125 °C by dc reactive magnetron sputtering
- C.S. McCormick
- C.E. Weber
- et al.
- 1997
- Applied Physics Letters
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.