Characterization of iodoheptafluoropropane as a dielectric etchant. I. Process performance evaluation
- Simon Karecki
- Ritwik Chatterjee
- et al.
- 2001
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
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Plasma abatement reduces PFC emission
- Victor Vartanian
- Laurie Beu
- et al.
- 2000
- Semiconductor International