Nonchemically amplified positive photoresist for synchrotron radiation x-ray lithography
- Daniel Bucca
- A. Aviram
- et al.
- 1995
- Microlithography 1995
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This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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4 results for W.R. Brunsvold
1X deep UV lithography with chemical amplification for 1-micron DRAM production
- John G. Maltabcs
- Steven J. Holmes
- et al.
- 1990
- Microlithography 1990
193nm single layer resist materials: Total consideration on design, physical properties, and lithographic performances on all major alicyclic platform chemistries
- T. Kajita
- Y. Nishimura
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Chemically amplified resist processing with top coats for deep-ultraviolet and e-beam applications
- Karen Petrillo
- James Bucchignano
- et al.
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures