Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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3 results for T. Hughes

Evolution of a 193 nm bilayer resist for manufacturing
- - R.W. Kwong
  - M. Khojasteh
  - et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
IBM 193nm bilayer resist: Materials, lithographic performance and optimization
- - Ranee Kwong
  - P. Rao Varanasi
  - et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Post-modification as a way to improve the lithographic performance of resist materials
- - Wenjie Li
  - P. Rao Varanasi
  - et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering