65nm CMOS technology for low power applications
- A. Steegen
- R. Mo
- et al.
- 2005
- IEDM 2005
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2 results for D.H. Hong
Chemical-mechanical polishing of SiCOH-based low-k dielectrics
- Wei-Tsu Tseng
- Akihisa Sakamoto
- et al.
- 2006
- ECS Meeting 2006