Initial experience establishing a EUV baseline lithography process for manufacturability assessment
- O.R. Wood II
- D. Back
- et al.
- 2007
- SPIE Advanced Lithography 2007
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3 results for R. Brainard
Dry Deposition and Dry Development of Metal Oxide Based Photoresist
- Nizan Kenane
- Anuja De Silva
- et al.
- 2024
- J. Photopolym. Sci. Tech.
Are extreme ultraviolet resists ready for the 32 nm node?
- Karen Petrillo
- Yayi Wei
- et al.
- 2007
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures