Publications

19 results for Martin Glodde

Spin-on organic hardmask for topo-patterned substrate
- - Kazuhiko Komura
  - Yoshi Hishiro
  - et al.
- 2014
- SPIE Advanced Lithography 2014
Patterning of CMOS device structures for 40-80nm pitches and beyond
- - Sebastian U. Engelmann
  - R.M. Martin
  - et al.
- 2012
- SPIE Advanced Lithography 2012
Investigation of pattern wiggling for spin-on organic hardmask materials
- - Goji Wakamatsu
  - Kentaro Goto
  - et al.
- 2012
- Proceedings of SPIE - The International Society for Optical Engineering 2012
A 0.021 μm² trigate SRAM cell with aggressively scaled gate and contact pitch
- - Michael A. Guillorn
  - Josephine Chang
  - et al.
- 2011
- VLSI Technology 2011
Performance of tri-layer process required for 22nm and beyond
- - Yayi Wei
  - Martin Glodde
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Fundamental investigation of Negative Tone Development (NTD) for the 22nm node (and beyond)
- - Guillaume Landie
  - Yongan Xu
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Systematic studies on reactive ion etch-induced deformations of organic underlayers
- - Martin Glodde
  - Sebastian Engelmann
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Fluorine-free photoacid generators for 193 nm lithography based on non-sulfonate organic superacids
- - Martin Glodde
  - Sen Liu
  - et al.
- 2010
- J. Photopolym. Sci. Tech.
Measurements of acid generation by extreme ultraviolet irradiation in lithographic films
- - Martin Glodde
  - Dario L. Goldfarb
  - et al.
- 2007
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures