Dual stress liner for high performance sub-45nm gate length SOI CMOS manufacturing
- H.S. Yang
- R. Malik
- et al.
- 2004
- IEDM 2004
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3 results for Y. Toyoshima
High performance 65 nm SOI technology with dual stress liner and low capacitance SRAM cell
- E. Leobandung
- H. Nayakama
- et al.
- 2005
- VLSI Technology 2005
SODEL FET: Novel channel and source/drain profile engineering schemes by selective Si epitaxial growth technology
- Satoshi Inaba
- Kiyotaka Miyano
- et al.
- 2004
- IEEE Transactions on Electron Devices