Hollow Cathode Etching of Si and SiO2 Using CF4 and H2
- G. Fortuño-Wiltshire
- G.S. Oehrlein
- 2019
- JES
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X-ray photoemission and Raman scattering spectroscopic study of surface modifications of silicon induced by electron cyclotron resonance etching
- A.S. Yapsir
- G.S. Oehrlein
- et al.
- 1990
- Applied Physics Letters