Sub-50 nm half-pitch imaging with a low activation energy chemically amplified photoresist
- G.M. Wallraff
- D. Medeiros
- et al.
- 2004
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
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80 results for J. Hoffnagle
Fast calculation of images for high numerical aperture lithography
- Alan E. Rosenbluth
- Gregg Gallatin
- et al.
- 2004
- SPIE Advanced Lithography 2004
Liquid immersion lithography - Evaluation of resist issues
- William Hinsberg
- Gregory Wallraff
- et al.
- 2004
- Microlithography 2004
An achromatic refractive laser beam reshaper
- C. Michael Jefferson
- John A. Hoffnagle
- 2003
- SPIE Optical Science and Technology 2003
Beam shaping with a plano-aspheric lens pair
- John A. Hoffnagle
- C. Michael Jefferson
- 2003
- Opt. Eng.
Extendibility of chemically amplified amplified resists: Another brick wall?
- William Hinsberg
- Frances Houle
- et al.
- 2003
- Microlithography 2003
Characterization of photoresist spatial resolution by interferometric lithography
- John A. Hoffnagle
- William D. Hinsberg
- et al.
- 2003
- Microlithography 2003
Chirped excitation of optically-dense inhomogeneously broadened media using Eu3+:Y2SiO5
- T.L. Harris
- G.W. Burr
- et al.
- 2003
- CLEO 2003
Chirped excitation of optically-dense inhomogeneously broadened media using Eu3+:Y2SiO5
- T.L. Harris
- G.W. Burr
- et al.
- 2003
- CLEO 2003
Sensitivity of a refractive beam reshaper to figure error
- John A. Hoffnagle
- 2002
- SPIE Optical Science and Technology 2002