Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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2 results for S.N. Chakravarti

A study of CClF₃/H₂ reactive ion etching damage and contamination effects in silicon
- - X.C. Mu
  - S.J. Fonash
  - et al.
- 1986
- Journal of Applied Physics
Silicon near-surface disorder and etch residues caused by CCIF ₃/H₂ reactive ion etching
- - G.S. Oehrlein
  - C.M. Ransom
  - et al.
- 1985
- Applied Physics Letters