Patterning of 100 nm features using X-ray lithographyAzalia A. KrasnoperovaScott Hectoret al.1997J. Photopolym. Sci. Tech.
An electron microscope investigation of the effect of phosphorous doping on the plasma etching of polycrystalline siliconE.A. IreneE. Tierneyet al.2019JES
Highly selective KOH-based etchant for boron-doped silicon structuresE. BassousA.C. Lamberti1989Microelectronic Engineering