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Publication
Proceedings of SPIE 1989
Conference paper
X-ray lithography exposures using synchrotron radiation
Abstract
A beamline for making X-ray lithography exposures using synchrotron radiation has been built and is now in operation at Brookhaven National Laboratory. The characteristics of synchrotron radiation and the reasons for using such a source are discussed. A description of the beamline and its control system is given, and results of early exposures are presented. © 1983 SPIE.