Vapor phase self-assembly of fluorinated monolayers on silicon and germanium oxide

Abstract

Molecular orientation in monomolecular thin organic films and surface coverage on Ge/Si oxide was measured by attenuated total reflectance Fourier transform infrared spectroscopy. A gas phase reactor allowed for precise control of surface hydration and reaction temperature during the deposition of monofunctional perfluorated alkylsilanes. It is therefore considered superior to solution-based silylation procedures commonly employed.