Sang-Min Park, Mark P. Stoykovich, et al.
Advanced Materials
Molecular orientation in monomolecular thin organic films and surface coverage on Ge/Si oxide was measured by attenuated total reflectance Fourier transform infrared spectroscopy. A gas phase reactor allowed for precise control of surface hydration and reaction temperature during the deposition of monofunctional perfluorated alkylsilanes. It is therefore considered superior to solution-based silylation procedures commonly employed.
Sang-Min Park, Mark P. Stoykovich, et al.
Advanced Materials
C.M. Brown, L. Cristofolini, et al.
Chemistry of Materials
J.H. Stathis, R. Bolam, et al.
INFOS 2005
M. Hargrove, S.W. Crowder, et al.
IEDM 1998