J. Paraszczak, J.M. Shaw, et al.
Micro and Nano Engineering
Molecular orientation in monomolecular thin organic films and surface coverage on Ge/Si oxide was measured by attenuated total reflectance Fourier transform infrared spectroscopy. A gas phase reactor allowed for precise control of surface hydration and reaction temperature during the deposition of monofunctional perfluorated alkylsilanes. It is therefore considered superior to solution-based silylation procedures commonly employed.
J. Paraszczak, J.M. Shaw, et al.
Micro and Nano Engineering
J.C. Marinace
JES
Hiroshi Ito, Reinhold Schwalm
JES
R. Ghez, M.B. Small
JES