PaperSilylation of resist materials using di- and polyfunctional organosilicon compoundsE. Babich, J. Paraszczak, et al.Microelectronic Engineering
Conference paperSelf-assembling materials for lithographic patterning: Overview, status and moving forwardWilliam Hinsberg, Joy Cheng, et al.SPIE Advanced Lithography 2010
PaperEvidence for the heavy-fermion normal state of high-temperature superconductors from the theory of spectroscopyP.C. Pattnaik, D.M. NewnsPhysical Review B
PaperDirected assembly of lamellae-forming block copolymers by using chemically and topographically patterned substratesSang-Min Park, Mark P. Stoykovich, et al.Advanced Materials