Conference paperPerformance data on new tunable attenuating PSM for 193nm and 157nm lithographyHans Becker, Frank Schmidt, et al.Photomask and Next-Generation Lithography Mask Technology 2004
Conference paperBetter on wafer performance and mask manufacturability of contacts with no or non-traditional serifsDonald Samuels, Ian StobertSPIE Photomask Technology + EUV Lithography 2007
PaperOn the capacities of bipartite Hamiltonians and unitary gatesCharles H. Bennett, Aram W. Harrow, et al.IEEE Trans. Inf. Theory
Conference paperMeasurement, modeling, and analysis of internet video sharing site workload: A case studyXiaozhu Kang, Hui Zhang, et al.ICWS 2008
