G. Will, N. Masciocchi, et al.
Zeitschrift fur Kristallographie - New Crystal Structures
The low-temperature behaviour of the resistance of indium oxide samples is discussed within the framework of localisation theories. It is demonstrated that, in three dimensions, the interplay between the effective inelastic diffusion length lin and the correlation length xi determines the nature of the diffusion process. A crossover to two-dimensional behaviour is observed once lin becomes comparable with the sample thickness.
G. Will, N. Masciocchi, et al.
Zeitschrift fur Kristallographie - New Crystal Structures
P. Martensson, R.M. Feenstra
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
T.N. Morgan
Semiconductor Science and Technology
D.D. Awschalom, J.-M. Halbout
Journal of Magnetism and Magnetic Materials