T. Vanzandt, R. Browning, et al.
Journal of Electron Spectroscopy and Related Phenomena
A specimen introduction/reaction system is described for a transmission electron microscope modified for UHV operation. The dry-pumped and UHV-compatible reaction chamber can be used for subjecting microscope specimens to RF-plasma treatments. The plasma oxidation and reduction of an in-situ-deposited particulate palladium film supported on amorphous alumina is described. A significant degree of redispersion is caused by this low-temperature process. © 1987.
T. Vanzandt, R. Browning, et al.
Journal of Electron Spectroscopy and Related Phenomena
R. Browning, T. Vanzandt, et al.
Journal of Electron Spectroscopy and Related Phenomena
H. Poppa
Vacuum
C.R. Henry, H. Poppa
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films