Ehud Altman, Kenneth R. Brown, et al.
PRX Quantum
Paper
The self-assessment trap: Can we all be better than average?
Related
Conference paper
Characterization of a next generation step-and-scan system
Timothy J. Wiltshire, Joseph P. Kirk, et al.
SPIE Advanced Lithography 1998
Robert Manson Sawko, Malgorzata Zimon
SIAM/ASA JUQ
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007